Semiconductor Process Solutions for Fully Integrated Process Characterization and Monitoring

Semicon Process Solutions are fully integrated process characterization and monitoring systems. Electron ionization time-of-flight mass spectrometry enables the simultaneous detection of precursors, byproducts, and trace species to guide immediate process control action and to inform analytics and process intelligence for deposition, etch, and lithography.

Semicon Process Solutions is adept at meeting complex process demands, offering rapid and non-invasive identification of any deviations in the process as they occur in real-time.

• Background reduction with notch filter technology: Attenuate specific abundant species to control mass spectral interferences.
• Fast and sensitive mass spectrometric monitoring: TOF mass analyzer enables real-time monitoring of all process species with isotopic mass resolution at sub-second refresh rates.
• Large dynamic range: Simultaneous detection of all precursors, byproducts, and trace species in semiconductor processes.
• Long-term stability: Accurate and reproducible response.
• Powerful software: Simple control interface with a fully documented API for system integration.
• Ready for diverse semiconductor applications: Reactor health state (RHS) monitoring, end-point detection, plasma diagnostics and process optimization.
• Robust and mobile: Rugged, flexible configuration allows precision in harsh environments and portability for non-invasive detection.

Specifications

Semicon Process Configurations and Specifications

Semicon Process Analyzers come in three distinct models, with a variety of accessories available to tailor them for particular fabrication applications.

• Process Gas Analysis Option: This solution configuration is ideal for the analysis and monitoring of neutral species present in semiconductor processes with ppm sensitivity and millisecond sampling rates.
• Process Ion Analysis Option: This solution is designed for analyzing and monitoring both ionic and neutral species within semiconductor processes, offering parts-per-million (ppm) sensitivity and millisecond sampling rates.
• Process Ion Energy Analysis Option: This solution configuration is best suited for the simultaneous analysis of the ionic species, mass, and energy in semiconductor processes with better than 0.5 eV energy and 10 microseconds time resolution, ppm sensitivity, and millisecond sampling rates.

Accessories

• Inlet manifold, which allows for measurements at different process pressure ranges
• Multiport Valve for cluster applications or similar

Dynamic Range and Limits of Detections

• Better than ppm sensitivity for most elements @ 1 kHz acquisition rate
• > 5 orders of magnitude of dynamic range

System Specifications

Source: TOFWERK