Please provide an introduction of TOFWERK and its main areas of focus
TOFWERK is a highly innovative and dynamic company with a strong background in developing technologies designed to measure compounds under very challenging conditions. One of our primary areas of focus is atmospheric science, where we measure all present compounds in real-time with extremely high sensitivity, detecting concentrations as low as a few parts per trillion. This capability is essential for understanding one of the most diluted environments—the atmosphere.
How do your technologies in atmospheric science align with the needs of the semiconductor industry?
The requirements in atmospheric science align closely with those in the semiconductor industry. Advanced technology nodes in semiconductors, now reaching the low nanometer scale, demand the real-time detection of foreign air molecules and contaminants to promptly identify contamination events. Both fields require high sensitivity and are capable of detecting a single molecule among a trillion, which is where our expertise comes into play.
What role does time-of-flight technology play in your solutions?
Time-of-flight technology is central to what we do. It allows us to gather information on all molecules in a sample simultaneously. For airborne molecular contamination solutions, this means we can detect all types of contaminants, ensuring contamination-free environments. For semiconductor process solutions, it enables process optimization that is significantly more efficient than traditional methods. In both cases, our technology enhances yields and reduces operational costs compared to conventional technologies.
What distinguishes TOFWERK's approach to measuring compounds?
Our approach has two key distinctions. First, we measure compounds without fragmentation. This eliminates the need for complex data processing with mathematical algorithms, as we measure compounds directly. Second, our instruments cover all categories of compounds with a single device, avoiding the need to combine multiple technologies to address different contaminant categories.
What challenges does the semiconductor industry face, and how is TOFWERK addressing them?
As the semiconductor industry advances towards smaller node sizes, 3D architectures, and increasingly complex materials, there’s a growing need for analytical tools with extreme sensitivity. These tools must detect contamination at the molecular level while analyzing a broader range of compounds. Tofwerk is well-positioned to address these needs with solutions specifically designed for these challenges, capturing the full data set of measured samples rather than targeting only a few compounds.
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Are there other industries where TOFWERK’s technology is making an impact?
We are actively developing new technologies for a wide range of applications. For example, we are working on detecting PFAS, also known as "forever chemicals," and measuring stack emissions using advanced, future-proof solutions. Both applications are highly relevant for sustainability efforts today.
Can you share more about TOFWERK's collaborations and global reach?
We are proud to collaborate with partners not only across Europe but also globally. These partnerships enable us to develop cutting-edge technologies tailored to specific needs in various industries. Our work in detecting PFAS and measuring stack emissions highlights the importance of these collaborations, especially in addressing critical challenges like environmental sustainability.
What is next for TOFWERK?
Our focus is on continuing to innovate and expand our reach across different industries and applications. We aim to enhance our technologies further to meet emerging challenges, particularly in sustainability and contamination detection. By staying at the forefront of innovation, we are confident in our ability to make a significant impact in the years to come.
Driving Efficiency and Sustainability: TOFWERK at Semicon Europa
This information has been sourced, reviewed and adapted from materials provided by TOFWERK.
For more information on this source, please visit TOFWERK.
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