The SC 1500 inline sputtering system offers a modular, cost-effective and scalable design to satisfy the requirements of high-volume or pilot production. Load locks with multiple pallet handling for continuous tip to tail processing enable target utilization and optimal throughput.
Key Features
The key features of the SC1500 inline sputtering system are:
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Can process a number of size and shape substrates without costly retooling
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Linear magnetron cathodes are provided for single or dual-sided sputter deposition
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RF, DC, pulse DC sputtering capability
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Reactive sputtering is possible
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RF substrate etch/pre-cleaning
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Cryogenic or turbo high vacuum pump packages
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HMI “Human Machine Interface” includes recipe control, data logging, historical trending, tolerance checking, user level access, SECS/GEM interface