May 29 2009
Nanometrics Incorporated (Nasdaq: NANO), a leading supplier of advanced process control metrology systems used primarily in the manufacturing of semiconductors, solar photovoltaics and high-brightness LEDs, today announced a follow on order for multiple Atlas® metrology systems. These systems will be delivered within the second quarter of this year to a leading memory customer as part of its plan to leverage Nanometrics’ technology across high-volume manufacturing lines, in support of film thickness, wafer stress/bow, and optical critical dimension (OCD) metrology.
“This latest order, both in scale and timing, demonstrates that our technology is a critical component for the manufacturing of leading generation memory devices,” commented Michael Fischer, Vice President of Sales at Nanometrics. “The OCD market is now established, as we’ve witnessed our customers increasingly migrating CD-SEM measurements over to Nanometrics’ OCD solution due to its ability to measure 3-D complex structures directly on memory arrays. These Atlas systems, as equipped, will allow seamless transition between thin film and OCD metrology by incorporating the NanoCD™ suite and the industry-leading capability of NanoDiffract™. The NanoCD suite, launched last year, has increased the adoption and proliferation of our OCD solutions into high-volume manufacturing.”