MEI, a diversified manufacturing and service company serving the solar, semiconductor, and high technology industries, announced that its Pura wet processing system has achieved a major milestone to produce high-purity polysilicon. This ultra-pure electronic-grade material is suitable for high efficiency solar cell and semiconductor production.
MEI's Pura wet processing system for polysilicon
Earlier, drying of tiny granular material in large quantities has been considered as impossible. However, Pura system has made this possible and produces polysilicon in any form factor, ranging from chunks to granules. It decreases energy consumption by 70% to 80% or higher than the existing wet processing and drying systems. In addition, the system reduces water and chemical consumption. It also minimizes the footprint by over 60%, thus saving the manufacturing floor space. With the use of MEI’s wet processing system, manufacturers will be able to enhance their productivity and decrease their costs while attaining a high-purity product, remarked President and CEO of the company, Dan Cappello.
The system includes a unique process IP to etch, rinse and dry polysilicon materials. The Pura wet processing system also features the company’s patent-pending FlashDry cold dry process, which dries granular, fines and scrap polysilicon materials without the use of heat. This helps to decrease surface contamination and maintain the purity level attained during the wet processing phase. Other benefits of the Pura wet processing system are a measurably drier product, less oxidation and less metallic contamination. Additionally, the process IP breakthroughs of MEI can considerably decrease the cost of ownership of the PV manufacturers. IDX is proprietary control software of the company, which delivers access to process data generated from the Pura system. This enables engineers to examine the process that takes place in the tanks or chambers effectively.