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US Patent Office Allows Rubicon Technology’s Key Patent for In-situ Crystal Orientation

Rubicon Technology, a provider of advanced electronic materials such as sapphire substrates and other products to the semiconductor, LED, and optical industries, has reported the allowance of its patent application titled ‘Intelligent Machines and Process for Production of Monocrystalline Products with Goniometer Continual Feedback’ by the United States Patent and Trademark Office.

The patent encompasses Rubicon Technology’s process and equipment designed to do in-situ orientation of its sapphire crystals on different fabrication equipment utilized by the company. Rubicon Technology’s customers in the RFIC, SoC, optical, and LED markets have unique prerequisites for the sapphire products’ crystal planar orientation based on their applications.

The new patented orientation technology offers high accuracy in sapphire planar orientation and avoids time-consuming processes by carrying out the orientation in the fabrication equipment. These advantages will help Rubicon customers achieve cost savings.

Rubicon Technology’s President and Chief Executive Officer, Raja M. Parvez stated that the company is acknowledged for its crystal growth technology expertise and its technological dominance extends from raw material to final sapphire wafers. This patent represents one of several technological advancements the company put in place to fulfill evolving requirements of its customers.

Rubicon Technology uses its proprietary crystal growth technology for superior quality sapphire production in a form that enables for mass production of different orientations and sizes of substrates and windows. The vertically-integrated manufacturer has expertise in crystal growth, wafer slicing, high precision core drilling, large-diameter polishing, surface lapping and wafer cleaning processes.

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