Jul 26 2013
Axcelis Technologies, Inc., a leading supplier of enabling ion implantation solutions for the semiconductor industry, announced that it has received an order for its Optima HDx high current implanter from one of the world's leading foundries.
The system features the Company's Eterna ELS3 Source, which delivers over 500 hours of source life for carbon and germanium species, for a compelling cost of ownership advantage.
"We're pleased to be able to offer our customers the industry's most advanced ion source technology," said Bill Bintz, Executive Vice President of Product Development, Engineering and Marketing. "The Eterna ELS3 has delivered truly remarkable source life performance in high volume production of carbon applications at this site, providing significant cost savings for the customer. We're excited about this order, and look forward to expanding our high current implant installed base." The Eterna ELS3 includes patent pending hardware and process improvements designed to extend source life by an unprecedented 500% improvement for carbon, and a 500% improvement for germanium applications. The system is available as an option on new Optima HDx tools, as well as an upgrade to installed systems.