An all-new vertical and mobile mounting tower gives the Hiden HPR-30 low-pressure process gas analyser stable support for mounting directly to small and light-loading process chamber ports at heights up to 1.8M(6ft).
The HPR-30, operating in the pressure regime 1mbar through to ultra-high vacuum, provides real-time measurement of gas composition in multiple low-pressure processes including vacuum coating, plasma etch and deposition, ALD and CVD for example.
The quadrupole mass spectrometer-based system is complete with differential turbo-molecular pumping, on-board vacuum gauge selector valves for auto-switching between system base and process pressure, PC interface and Hiden MASsoft control program.
The system is fully programmable for automated operation and data reporting. Multiple I/O channels enable two-way communication with the process control system to maintain process integrity, providing confirmation of process gas status, gas control valve function and shut-off efficiency, contamination levels and air leakage ingress, and the HPR-30 additionally functions as a very high sensitivity leak detector selectable for optimised operation with helium or any alternative search gas.
For further information on this or any other Hiden Analytical products contact Hiden Analytical at [email protected] or visit the main website at www.HidenAnalytical.com.