Mar 30 2006
Applied Materials has announced that Elpida Memory, Inc., a leading DRAM manufacturer, has selected the Applied Centura(R) AdvantEdge(TM) system in its recent fab investment cycle for all of its silicon etching applications, including next-generation high k and metal gate structures. The AdvantEdge system provides unparalleled process control to reduce critical dimension variation by up to 50% compared with any other etch system. Multiple new AdvantEdge systems were shipped to Elpida's new 300mm fab in Hiroshima, Japan, for the production of advanced 90nm-70nm DRAM chips.
Jiro Yamamoto, plant manager of Hiroshima Elpida Memory, said, "The key factor in our selection of the AdvantEdge Etch system for our most advanced DRAM production was its unique tuning capability, which delivers superior process performance for a wide range of advanced memory applications. Based on our positive experience with Applied's earlier silicon etch technology, we expect the AdvantEdge Etch system to achieve high productivity and reliability as we move to volume production. Applied's consistently excellent support, and the capability to also extend our large installed base of Applied Centura DPS(R) etch systems with the AdvantEdge chamber technology, are additional significant advantages."
"We appreciate Elpida's selection of the AdvantEdge etcher, which demonstrates the exceptional value of the system in the challenging environment of high-volume memory production, where advanced technological capability and cost-effectiveness are both key to profitability," said Tom St. Dennis, senior vice president and general manager of Applied Materials' Etch, Cleans and Front End Products Group. "Our 2mm edge exclusion capability, coupled with the industry's tightest critical dimension performance, has created a new state of the art in silicon etch. With over 90 chambers already shipped to customers, the rapid industry acceptance of this new system is helping us make a major impact in the etch marketplace, where the shift to advanced production and next-generation development has shown the severe limitations of etchers that use older technology."
For more information on the Applied AdvantEdge Etch system, please visit http://www.appliedmaterials.com/products/advantedge_etch.html
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