Search

Search Results
Results 3181 - 3190 of 7502 for semiconductors
  • News - 29 Nov 2005
    In what promises to be an important advance, researchers at the University of California, Santa Barbara have developed a novel laser by bonding optical gain layers directly to a silicon laser cavity....
  • News - 26 Sep 2005
    Cree has announced that it can now take orders for 100 mm (4-inch) n-type silicon carbide (SiC) substrates and epitaxy material. The current Cree standard for SiC is 3-inch diameter material. The...
  • News - 20 Jul 2005
    Visitors to the Regensburg festival, which took place from June 24 to 26, were attracted to the town’s famous Stone Bridge by a mysterious light. Osram Opto Semiconductors bathed the historic...
  • News - 18 May 2005
    Producing more than 200 lumen from an operating current of only 700 milliamps, the tiny 3 x 1 cm Ostar Lighting LED is a real bright spark. This is the brightest semiconductor light source yet from...
  • News - 20 Apr 2005
    One year after beginning the project, developers at Osram Opto Semiconductors have introduced a prototype of an OLED light source which has a color rendering index of 80, a luminous efficiency of...
  • News - 18 Apr 2005
    One year after beginning the project, developers at Osram Opto Semiconductors have introduced a prototype of an OLED light source which has a color rendering index of 80, a luminous efficiency of...
  • News - 10 Mar 2005
    Cabot Supermetals, a business unit of Cabot Corporation, has announced the official opening of its new Thin Films manufacturing facility located in Etna, OH. The new 90,000 sq. ft. state-of- the-art...
  • News - 4 Mar 2005
    Cabot Supermetals, a business unit of Cabot Corporation, has announced the official opening of its new Thin Films manufacturing facility located in Etna, OH. The new 90,000 sq. ft. state-of- the-art...
  • News - 22 Oct 2004
    Hitachi Chemical Co., Ltd. has recently developed a high-performance CMP slurry product for STI (Shallow Trench Isolation) that can decrease scratches from polishing by two-thirds and provide a...
  • News - 4 Aug 2004
    ASTM Committee G02 on Wear and Erosion has committed itself to standardizing the chemical-mechanical polishing process by creating a task group to develop a proposed new standard, tentatively titled...

While we only use edited and approved content for Azthena answers, it may on occasions provide incorrect responses. Please confirm any data provided with the related suppliers or authors. We do not provide medical advice, if you search for medical information you must always consult a medical professional before acting on any information provided.

Your questions, but not your email details will be shared with OpenAI and retained for 30 days in accordance with their privacy principles.

Please do not ask questions that use sensitive or confidential information.

Read the full Terms & Conditions.