Oxford Instruments has just won an order for 6 systems to equip the Molecular Foundry at the Lawrence Berkeley National Laboratory (Berkeley Lab), California, USA, a DOE user facility for nanoscience and a centre of excellence in scientific research. The Oxford Instruments systems ordered comprise 6 tools – 3 ICP Plasma etch systems, 2 Plasmalab®80Plus tools, and a FlexAL® atomic layer deposition tool. The systems will enable users at the Molecular Foundry to utilise plasma based etching and deposition to pursue pioneering research in nanoscience. The ICP systems and FlexAL will have new capabilities tailored to Berkeley Lab’s specific research requirements.
The Molecular Foundry is a U.S. Department of Energy (DOE) national user facility charged with providing support to nanoscience researchers in academic, government and industrial laboratories around the world. It also provides users with instruments, techniques and collaborators to enhance their studies of the synthesis, characterisation and theory of nanoscale materials.
As a leading provider of high technology tools and systems, Oxford Instruments Plasma Technology (OIPT) is involved in a long term collaboration with the prestigious LBNL research institute. The collaboration includes OIPT’s funding of a Post doctoral fellow at Berkeley Lab’s Molecular Foundry, looking specifically at advanced process control for nanoetching, and demonstrating OIPT’s continuing involvement in scientific research.
The Oxford systems will enable the Molecular Foundry in areas such as etching of micro and nano-scale silicon features with ultra-smooth sidewalls, pattern transfer of sub-20 nm features and beyond, plasma etching for nanoimprint lithography templates and printing, and sub-nanometer control of conformal film deposition.
Mark Vosloo, Sales Director for Oxford Instruments Plasma Technology comments, “We are delighted to receive this order from such a prestigious established customer, which underlines the importance we place on providing market-leading process technologies.”