Mar 7 2013
Axcelis Technologies, Inc., a leading supplier of innovative, high-productivity solutions for the semiconductor industry, announced today the Company's innovative Purion MTM medium current implanter has been selected by another one of the world's leading chipmakers. The system will be used to develop and manufacture next generation memory and FLASH devices.
Bill Bintz , executive vice president of product development, engineering and marketing commented, "We're very excited about this new win and the growth opportunities the system provides Axcelis." He continued, "The Purion M was selected after an extensive evaluation focused on implant accuracy, repeatability, and purity; key requirements to achieve the customer's most challenging demands for emerging new device architectures. The system's innovative angle control system provides significant advantages over the competition in this critical area. In addition, the Purion M effectively demonstrated its ability to maintain the industry's highest levels of productivity, beyond the traditional operating range for medium current implanters, resulting in unmatched levels of manufacturing flexibility and capital efficiency, significantly reducing their implant bay operating costs."
The Purion M
The new Purion M medium current system utilizes Axcelis' advanced spot beam line technology coupled with a 500 WPH single wafer platform. This combination provides chip manufacturers with exceptional reliability, and remarkable precision and productivity for the widest range of implant energies and doses to address applications that include the formation of precise wells, channels and source/drain junctions. In addition, the system's industry-leading energy range and beam currents enable it to be utilized for implant processes traditionally run on high energy or high current implanters, providing chipmakers with maximum manufacturing versatility and capital efficiency. The Purion M's beam line design utilizes Axcelis' patented angular energy filter and angle control system, eliminating all forms of energy contamination while ensuring the industry's most accurate dopant placement. The result is an exceptionally pure and precise implant, enabling the highest production yields.