The EVG7200 automated UV nanoimprint lithography system utilizes EVG’s novel SmartNIL technology and EVG’s materials expertise to allow mass manufacturing of micro- and nanoscale structures.
The system helps apply the latest soft stamp and imprint capability of SmartNIL to bigger substrates and smaller geometries, with resolution measuring down to 40 nm* in volume production. This allows higher cost-of-ownership (CoO) benefits and helps achieve the complete manufacturing ability of nanoimprint lithography.
*Resolution is based on process and template
Features
- Proprietary SmartNIL® technology available with multiple-use polymer stamp technology
- Optional top-side alignment
- Volume-proven imprinting technology with excellent replication fidelity
- Optional mini-environment
- Comes with automated cassette-to-cassette handling along with semi-automated R&D mode
- Scalability ensured from R&D to production
- Availability of demolding, combined imprinting, UV curing and working stamp fabrication
- System housing for ideal process stability and reliability
- Open platform offered for all commercially available imprint materials
Technical Data
| . |
. |
| Wafer diameter (substrate size) |
75 up to 200 mm |
| Resolution |
≤40 nm (resolution dependent upon template and process) |
| Supported Process |
SmartNIL® |
| Exposure source |
High-power LED (i-line) > 400 mW/cm² |
| Alignment |
Optional top side alignment |
| Automated separation |
Supported |
| Mini environment and climate control |
Optional |
|
Working stamp fabrication
|
Supported |
Source: EV Group