SENTECH offers leading edge plasma process technology equipment for etching and deposition and thin film measurement instrumentation based on ellipsometry. The advanced SENTECH plasma equipment is based on the inductively coupled plasma source PTSA (planar triple spiral antenna) which was developed by SENTECH for low damage and high rate etching and deposition. The latest product development at SENTECH expands the ICPECVD product line by ALD and plasma enhanced ALD systems.
Group picture in front of SENTECH building
SENTECH has organized a seminar on Plasma Process Technology on February 27, 2014 held at SENTECH Instruments in Berlin Adlershof. The seminar offers great networking opportunities for specialists of the thin film plasma community. The Seminar was already the 8th plasma seminar and attracted more than 50 specialists from industry, research institutions and universities.
The group picture was taken during lunch break in front of the SENTECH building in Berlin Adlershof.
At the seminar recent developments in plasma etching, in plasma enhanced deposition and in atomic layer deposition were presented by invited speakers and by specialists from SENTECH Instruments.
One of the outstanding highlights of this event was the presentation on ALD combined with PECVD of Mr Bülow from TU Brunswick. The combination of ALD and PECVD in one SENTECH tool enables remarkable OLED encapsulation.
A presentation on Si etching application held by Mr Voigt from Leibnitz Institute for Photonic Technologies, Jena underlined the high efficiency of Si etching with SENTECH ICP plasma systems. Another highlight on graphene entitled “Challenges in graphene synthesis and semiconductor/graphene structures” was presented by Mr Lukosius from IHP Frankfurt/Oder. Other presentations reported on product technologies and application highlights.
Finally the participants of the seminar were invited to visit SENTECH’s application laboratories and manufacturing facility. Quoting some of the visitors, the seminar was described as very innovative and inspiring, the excellent networking opportunities were specially complimented.
Motivated by the success of the seminar on plasma process technology in 2014, SENTECH considers to continue to offer seminars dedicated to SENTECH Plasma Process Technology.
The presentations and information are available by SENTECH upon request.
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