How can IR Light be Used in Semiconductors?

As the semiconductor industry advances toward nanoscale, single-crystalline devices, the need for material purity and precision in manufacturing grows increasingly critical. Research and development in semiconductor materials, along with process analytical technologies, are crucial for supporting the progression of semiconductor production lines.

FT-IR offers a simple and effective tool for investigating the basics of semiconductors, among other techniques. Its non-destructive nature, in combination with its high speed and sensitivity, makes it ideal for impurity quantification or failure analysis.

Bruker has recently conducted a webinar demonstrating the ways in which FT-IR can aid in research and development or process control. This session highlighted the tool's capability to provide detailed analysis of semiconductor materials and devices.

Our Application Expert gives an Overview of:

• Silicon quality control using FT-IR
• Room and low-temperature carbon and oxygen quantification in Silicon
• Shallow impurity quantification in Silicon
• Low-temperature photoluminescence for Si QC
• Semiconductor device characterization and development (laser, diode, sensors, etc.)
• Phonon spectroscopy and photoluminescence spectroscopy for band structure studies

Who Should Attend?

• Quality Control managers
• Laboratory Heads
• Analytics Heads
• Lab technicians
• Researchers

About the Speaker

Dr. Dan Wu has been an application manager at Bruker Optics for over ten years.