SU7000 & SU8700 Schottky Field Emission SEMs: Ultra High-Resolution & Analytical Imaging

Hitachi’s SU7000 and SU8700 FE-SEMs remarkably balance analytical power and ultra-high-resolution imaging. These two devices, which are made for both, have differing chamber and stage diameters but the same high-performance electron optics and analytical functions.

The SU7000 and SU8700 can handle a variety of applications. Consistent outcomes and exceptional productivity are guaranteed by their high brightness Schottky field emission electron source, single-scan multi-signal imaging capability, and optional workflow automation (with the EM Flow Creator software).

SU7000 & SU8700 Schottky Field Emission SEMs: Ultra High-Resolution & Analytical Imaging

Image Credit: Hitachi High-Tech Europe

Common Features:

  • Perfect for those who desire analytical and ultra-high-resolution imaging capabilities
  • Using a dual monitor user interface, display up to six image channels simultaneously
  • Analytical working distance of just 6 mm
  • Imaging and analytical work on non-conductive specimens are made possible by variable-pressure capabilities that eliminate the need for additional apertures
  • Advanced automation for streamlined workflows
  • Schottky field emission source. An electrostatic-magnetic hybrid objective lens and full-range beam boosting provide sub-nanometer resolution without requiring magnetic sample interaction

SU8700

  • Designed to inspect specimens up to 150 mm in diameter quickly (high throughput)
  • Use an optional inert-gas transfer mechanism to load samples through a conventional six-inch specimen exchange chamber

SU7000:

  • Larger chamber. It can hold specimens up to 80 mm in height and 200 mm in diameter
  • There are eighteen chamber access ports for possible attachments, including two cabling ports in the stage door

Key Features and Benefits

Ultra High-Resolution Imaging for Advanced Analysis

Obtain extremely precise information for applications ranging from quick and secure sample characterization and process management in industry to sub-nanometer imaging and analysis in research and development.

Both models include a Schottky field emission source with exceptional brightness and high stability. The source is paired with an electrostatic-magnetic hybrid objective lens and full-range beam boosting, enabling sub-nanometer resolution without magnetic sample interaction.

Users can also expand high-resolution imaging to non-flat specimens by obtaining excellent lateral resolution without the need for stage bias voltage. Reach resolutions of 0.8 nm (SU7000) and 0.6 nm (SU8700).

The optional variable pressure mode, accessible with a single mouse click and without any apertures, aids in the investigation of non-conductive specimens under high-current, high-voltage situations without the requirement for specimen coating.

An optional package that supports extra-wide field, or multi-field, EDS and EBSD analysis enables extremely precise scan field linearity and orthogonality under 70° stage tilt. Thus, you can produce EBSD mapping mosaics with outstanding matching quality (for instance).

SU7000 & SU8700 Schottky Field Emission SEMs: Ultra High-Resolution & Analytical Imaging

Image Credit: Hitachi High-Tech Europe

Multi-Channel Detection and Simultaneous Signal Processing

To ensure thorough analysis for difficult samples, collect more data in less time. Both SEMs, which have sophisticated secondary and backscattered electron detectors, can simultaneously acquire up to six different signal types and EDS elemental data at a working distance of only 6 mm. This also incorporates optional STEM signals and the simultaneous collection of in-column SE/BSE.

Users can fully optimize image signals at the moment of capture with the help of optional live viewing and signal enhancement processing, which aid in feature search and image preparation.

SU7000 & SU8700 Schottky Field Emission SEMs: Ultra High-Resolution & Analytical Imaging

Image Credit: Hitachi High-Tech Europe

Advanced Automation for Workflow Efficiency

Make repetitious processes easier and increase reproducibility. The optional EM Flow Creator program enables drag-and-drop workflow configuration, allowing you to concentrate on high-priority analysis. Automated operations such as stage alignment, recipe-based imaging, and pattern recognition-based precise positioning save operator time.

SU7000 & SU8700 Schottky Field Emission SEMs: Ultra High-Resolution & Analytical Imaging

Image Credit: Hitachi High-Tech Europe

Flexible Specimen Handling for Diverse Needs

Easily carry out studies on specimens of different sizes:

  • With a 6-inch specimen exchange chamber that enables quick sample loading and handling of specimens up to 150 mm in diameter, the SU8700 is designed for high-throughput applications
  • The SU7000 can hold specimens up to 200 mm in diameter and 80 mm in height because of its larger chamber and eucentric stage movement. The SEM has 18 access ports for connecting extra devices, including two cabling ports in the chamber door

SU7000 & SU8700 Schottky Field Emission SEMs: Ultra High-Resolution & Analytical Imaging

Image Credit: Hitachi High-Tech Europe

Intuitive User Interface for Effortless and Safe Operation

Streamline the process with an intuitive, adaptable interface that enhances decision-making and navigation. An optional dual-monitor configuration with adjustable display modes is available for both versions.

With the same working distance, operators can simultaneously examine, compare, and record up to six signals. Thanks to chamber-mounted color cameras that collect specimen images, specimens can be easily and accurately navigated by just clicking on the location of interest on the map.

Stage/sample collisions with an EDX, BSE, or STEM detector are impossible: the chamber design, which incorporates both software and hardware interlocks, ensures the operation is safe, even for unskilled users.

SU7000 & SU8700 Schottky Field Emission SEMs: Ultra High-Resolution & Analytical Imaging

Image Credit: Hitachi High-Tech Europe

Specifications

Source: Hitachi High-Tech Europe

  SU7000 SU8700
Image Resolution 0.8 nm @ 15 kV, 0.9 nm @ 1 kV 0.6 nm @ 15 kV, 0.8 nm @ 1 kV, 0.9 nm @ 0.3 kV
Magnification 20× to 2,000,000×
Electron Optics - Emitter Schottky Emitter
Electron Optics - Accelerating Voltage 0.1–30 kV (≥0.01 kV optional)
Probe Current Max. 200 nA
Detectors - Standard UD (Upper Detector), MD (Middle Detector), LD (Lower Detector)
Detectors - Optional PD-BSED (Semiconductor Type), UVD (Ultra Variable Pressure Detector), Bright Field STEM Detector, HAADF STEM Detector
Variable Pressure (VP) Mode - Range 5–300 Pa
Variable Pressure (VP) Mode - Available Detectors PD-BSED, UVD, UD, MD, LD
Specimen Stage - Control 5-axis Motor Drive
Specimen Stage - Movable Range (X, Y, Z, T, R) X: 0–135 mm, Y: 0–100 mm,
Z: 1.5–40 mm, T: -5–70°, R: 360°
X: 0–110 mm, Y: 0–110 mm,
Z: 1.5–40 mm, T: -5–70°, R: 360°
Specimen Chamber - Size Max. Ø200 mm, Max. 80 mm Height Max. Ø150 mm
Monitor (Optional) 23-inch LCD (1920×1080), supports dual monitors
Image Display Modes Large Screen (1280×960), Single Image (800×600), Dual Image (800×600, 1280×960), Quad Image (640×480), Hex Image (640×480)
Image Data Saving - Pixel Size 640×480, 1280×960, 2560×1920, 5120×3840, 10240×7680
Optional Accessories EDX, WDX, EBSD, CL, Cryogenic Transfer System, Compatible with various sub-stages EDX, WDX, EBSD, CL, inert-gas specimen transfer

 

Applications Gallery

Materials Science

Nanoparticles Containing Core-Shell Structure.

Nanoparticles Containing Core-Shell Structure. Fine surface structure is visible by SE signal (UD). Image Credit: Hitachi High-Tech Europe

 Nanoparticles Containing Core-Shell Structure.

Nanoparticles Containing Core-Shell Structure. Core (Ag) and Shell (SiO2) are easily distinguishable by BSE signal (MD). Image Credit: Hitachi High-Tech Europe

Semiconductors

Voltage Contrast Images of 7 nm process SRAM.

Voltage Contrast Images of 7 nm process SRAM. Image Credit: Hitachi High-Tech Europe

Planview Image of 3D NAND Flash Memory.

Planview Image of 3D NAND Flash Memory. Image Credit: Hitachi High-Tech Europe

Life Science

Ultrastructure of Arabidopsis thaliana

Ultrastructure of Arabidopsis thaliana. Image Credit: Hitachi High-Tech Europe

Ultrastructure of Arabidopsis thaliana

Ultrastructure of Arabidopsis thaliana. For Energy-Filtered BSE detection, ultrastructures such as thylakoid membranes is clearly visible. Image Credit: Hitachi High-Tech Europe

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