New Book on Crystal Growth Technology of Semiconductors and Dielectrics

Research and Markets has announced the addition of John Wiley and Sons Ltd's book "Crystal Growth Technology: Semiconductors and Dielectrics" to their offering.

Semiconductors and dielectrics are two essential materials found in cell phones and computers, for example, and both are manufactured by growing crystals.

Edited by the organizers of the International Workshop on Crystal Growth Technology, this ready reference is essential reading for materials scientists, chemists, physicists, computer hardware manufacturers, engineers, and those working in the chemical and semiconductor industries. They have assembled an international team of experts who present the current challenges, latest methods and new applications for producing these materials necessary for the electronics industry using bulk crystal growth technology.

From the contents:

  • General aspects of crystal growth technology
  • Compound semiconductor
  • Halides and oxide
  • Crystal growth for sustaining energy
  • Crystal machining

Key Topics Covered:

Part I. Basic Concepts in Crystal Growth Technology.

  • Thermodynamics Modeling of Crystal-Growth Processes (Eberhard Buhrig, Manfred Jurisch, Jrgen Korb, and Olf Ptzold).

  • Modeling of Vapor-Phase Growth of SiC and AIN Bulk Crystals (Roman A. Talalaev, Alexander S. Segal, Eugene V. Yakovlev, and Andrey N, Vorobev).

  • Advanced Technologies of Crystal Growth from Melt Using Vibrational Influence (Evgeny V. Zharikov).

Part II. Semiconductors.

  • Numerical Analysis of Selected Processes in Directional Solidification of Silicon for Photovoltaics (Koichi Kakimoto).

  • Characterization and Control of Defects in VCz GaAS Crystals Grown without B2O3 Encapsulant (Frank M. Kiessling).

  • The Growth of Semiconductor Crystals (Ge, GaAs) by the Combined Heather Magnet Technology (Peter Rudolph, Matthias Czupalla, Christiane Frank Rotsch, Frank-Michael Kiessling and Bernd Lux).

  • Manufacturing of Bulk AIN Substrates (Oleg V. Avdeev, Tatinana Yu. Chemekova, Heikki Helava, Yuri N. Makarov, Evgenii N. Mokhov, Sergei S. Nagalyuk, M. G. Ramm, Alexander S. Segal, and Alexander I. Zhmakin).

  • Interactions of Dislocations During Epitaxial Growth of SiC and GaN (Jochen Friedrich, Birgit Kallinger, Patrick Berwian, Elke Meissner).

  • Low-Temperature Growth of Ternary III-V Semiconductor Crystals from Antimonide-Based Quaternary Melts (Partha S. Dutta).

  • Mercury Cadmium Telluride (MCT) Growth Using ACRT and LPE (Peter Capper).

  • The Use of a Platinum Tube as an Ampoule Support in the Bridgman Growth of Bulk CZT Crystals (Narayanasamy Vijayan, Vernica Carceln, and Ernesto Diguez)

Part III. Dielectrics.

  • Modeling and Optimization of Oxide Crystal Growth (Svetlana E. Demina, Vladimir V. Kalaev, Alexander T. Kuliev, Kirill M. Mazaev, and Alexander I. Zhmakin).

  • Advanced Material Development for Inertial Fusion Energy (IFE) (Kathleen Schaffers, Andrew J. Bayramian, Joseph A. Menapace, Gregory T. Rogowski, Thomas F. Saules, Christopher A. Stolz, Steve B. Sutton, John B. Tassano, Peter A. Thelin, Christopher A. Ebbers, John A. Caird, Christopher P.J. Barty, Mark A. Randles, Charles Porter, Yiting Fei, and Bruce H. T. Chai).

  • Magneto-Optic Garnet Sensor Films: Preparation, Characterization, Application (Peter Grnet, Andreas Lorenz, Morris Lindner, and Hendryk Richert).

  • Growth Technology and Laser Properties of Yb-Doped Sesquioxides (Rigo Peters, Klaus Petermann, and Gnter Huber).

  • Continuous Growth of Alkali-Halides: Physics and Technology (Oleg Sidletskiy).

  • Trends in Scintillation Crystals (Alexander V. Gektin)

Part IV. Crystal Machining.

  • Crystal Machining Using Atmospheric Pressure Plasma (Yasuhisa Sano, Kazuya Yamamura, and Kazuto Yamauchi).

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