Qcept Technologies, a company specializing in wafer inspection solutions, has declared its participation in several major key nanotechnology conferences to be conducted during Q1 of 2012.
In the conferences, Qcept Technologies will emphasize the impact of non-visual defects (NVDs) on the semiconductor industry in terms of device yields and total profitability. The company’s ChemetriQ NVD inspection systems are becoming an integral part of semiconductor producers and device suppliers who are seeking for a solution to their NVD yield issues. The company is receiving repeat orders from them who also utilize cases experienced by the company in analog, memory and logic production applications.
Qcept Technologies’ Senior Process and Yield Technologist, Dr. Sungjin Cho will deliver a presentation on inspection systems for yield-restricting NVDs, including sub-monolayer metallic and organic residues, and process-induced charging for sophisticated process control and yield engineering at SEMICON Korea Metrology Inspection Forum on February 7, 2012.
Dr. Cho will present a summary on emerging NVDs and discuss case studies of semiconductor fabs that use NVD inspection for yield improvements at 19th Korean Conference on Semiconductors on February 17, 2012.
Qcept will co-present a paper with Samsung Electronics on the issues of charge NVDs happening at after develop inspection that cause physical pitting defects during after clean inspection at SEMATECH Surface Preparation and Cleaning Conference to be conducted from March 19 to 21, 2012 in Austin, Texas. The charge NVD worked as a predecessor to the physical defect and affected device yields in a sophisticated-node gate oxide module.
According to Robert Newcomb, Qcept Technologies’ Executive Vice President, besides eliminating yield loss for advanced IC manufacturers, NVD detection allows mainstream fabs enhance their processes by reducing cycle times, minimizing chemical usage and improve process equipment efficiency and throughput.