Mattson Technology, a major provider of sophisticated semiconductor processing equipment, has reported that it has received an order from a major foundry for the paradigmE etch system.
The foundry, which is the third etch customer of Mattson Technology, has placed the paradigmE etch system into production in its fab.
Rene George, who serves as Vice President and General Manager of Plasma Products Group, has stated that the designing equipment that provides both productivity and technology to customers is in the ‘DNA’ of Mattson Technology. This procurement of the paradigm etch system strengthens customers’ confidence in Mattson Technology's potential to provide etch processing performance and cost-of-ownership benefits that enable optimized productivity in the challenging foundry environment.
With this order, the paradigm etch system is continuously being adopted in the foundry market. The system is now in production in memory, CMOS image sensor, and foundry/logic customer fabs in various regions, which include Taiwan, Korea and China.
Mattson Technology designs, develops and supplies semiconductor wafer processing systems for use in the production of integrated circuits. The company is a major provider of plasma and rapid thermal processing systems to the worldwide semiconductor industry, and serves in three major product segments namely, etch, rapid thermal processing and dry strip. Through advancements in design and production, the company has manufactured technologically advanced systems, which help customers producing current and advanced semiconductor devices achieve productivity and cost efficiency.