Mar 12 2014
Axcelis Technologies, Inc., a leading supplier of enabling ion implantation solutions for the semiconductor industry, announced that it has received a multiple system order for the Company's new Purion XE™ single wafer, high energy implanter.
The Purion XE, which is the process tool of record for this customer's high energy requirements, will be installed as part of a capacity expansion at a fab in the Asia Pacific Region, and will be used in high volume production of advanced NAND devices. The systems ship in Q1.
John Aldeborgh, executive vice president, customer operations, said, "We are very excited to receive this order from one of the world's premiere suppliers of semiconductor devices. This customer utilizes the Purion XE versus competitive systems because of its exceptionally broad energy range and high beam currents, which translate directly to capital efficiency. As the industry leader in high energy implant, we are well equipped to help meet their needs for additional manufacturing capacity as well as achieve their advanced NAND roadmap goals."
The Purion Platform
The Purion platform redefines the ion implanter application space, delivering unmatched purity, precision and productivity to enhance customers' device performance and yield. On this platform, we've built the industry's first complete implant product solution designed specifically for advanced planar and 3D devices while providing the most flexible and productive manufacturing capability for your fab. The systems' common cross-product platform architecture is designed to drive manufacturing flexibility and lower the total cost of fab operations. All Purion implanters incorporate Axcelis' industry leading Purion Contamination Shield™ Defense System, for unsurpassed implant quality, so even the most sensitive devices can realize optimized device performance. The platform's proprietary Purion Vector™ dose and angle control system, and constant focal length scanning deliver the most precise and repeatable dopant placement available today. The platform's superior beam current performance combined with the Purion™ 500wph end station provides the industry's highest productivity. The Purion platform includes the Purion M™ medium current implanter, the Purion H™ high current implanter, and the Purion XE™ high energy implanter.