Apr 25 2007
Veeco Instruments Inc. announced today that it has received the first order for its new NEXUS PVD-HR(R) Physical Vapor Deposition (PVD) System from a leading manufacturer of hard disk drives. The system will be used for high-rate deposition of aluminum oxide for data storage applications. Veeco received the order during the first quarter of 2007.
Key technical features of the NEXUS PVD-HR System include the flexibility and process tune-ability of ion-assisted deposition with the high-rate requirements of thick overcoat applications. This reliable, high-throughput alumina PVD module provides high uniformity thickness and excellent wafer-to-wafer repeatability without target poisoning. Designed to provide arc-free and pinhole-free films, the tool incorporates "best-in-class" technology and components. As part of Veeco's NEXUS family, it can be integrated on a common hardware and software platform with complementary Veeco technologies such as ion beam deposition, ion beam etch, atomic layer deposition and reactive sputtering.
"As our customers transition to next generation thin film magnetic heads, the NEXUS PVD-HR System becomes critical for meeting the industry's stringent requirements of throughput and uniformity," commented James T. Jenson, Veeco's Vice President, General Manager of PVD/ALD Equipment. "In addition to featuring high reaction rates, excellent quality films, low film stress and a high growth rate, Veeco's new PVD-HR's small footprint helps lower our customers' cost of ownership.