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Results 381 - 390 of 392 for Aluminum nitride
  • Surface Modification of -TiAl Alloys by Nitrogen Plasma Deposition
    Article - 20 Sep 2005
    Two ã-TiAl alloys, Ti-47 at%Al-2 at%Nb-2 at%Cr(MJ12) and Ti-47 at%Al-2 at%Nb- 2 at%Mn+0.8 at%TiB2 (MJ47), have been modified in a nitrogen-ion plasma. Hardness and wear resistance were evaluated and...
  • Titanium - Corrosive Media
    Article - 11 Feb 2002
    The effects of various media such as alkalis, inorganic salts, organic chemicals, organic acids, oxygen, hydrogen, sulfur dioxide, hydrogen sulfide, nitrogen, ammonia and liquid metals on titanium are...
  • Microwave Sintering of Metals
    Article - 9 Oct 2001
    Metallic powders are good absorbers of microwaves and can be sintered by microwave radiation. Processing in this way has advantages over conventional methods including faster and more energy efficient...
  • Diamond-Like Carbon Coatings
    Article - 31 Jul 2001
    Diamond-like coatings are carbon films with high hardness, high resistivity and dielectric and optical properties. Deposition by plasma CVD, ion beam and closed field unbalanced magnetron sputter ion...
  • Calcium
    Article - 20 Jul 2001
    Calcium (Ca) is placed in group IIA of the periodic table along with St, Ba and Ra. The name calcium is derived from the Latin word “calas” meaning lime, which was known as early as the first...
  • Surface Hardening by Ion Implantation
    Article - 19 Jun 2001
    The process of ion implantation is explained and how it is able to form hard, wear resistant surfaces, and ultimately extend component life times.
  • Novel Ceramic Processing Routes
    Article - 31 May 2001
    Novel ceramic processing routes such as sol-gel production of aluminosilicates, core-shell zirconia, single crystal fibre processing and combustion synthesis are examined. The addition of fine powders...
  • Sintered Silicon Nitride (Si3N4 )
    Article - 3 Apr 2001
    Sintered silicon nitride (Si3NA) can only be densified without pressure with the addition of sintering aids such as magnesia, yttria or alumina.
  • Deposition of High Quality Films by the Inductively Coupled Plasma CVD Process
    Article - 7 Feb 2012
    This article discusses how ICP-CVD can aid the deposition of high-quality films.
  • Machinable Ceramic - Physical Properties of Shapal-M Machinable Ceramic from Precision Ceramics
    Article - 23 Nov 2008
    Shapal-M Machinable Ceramic has good heat resistance and an extremely low coefficient of thermal expansion.has a broad range of uses as a structural material and for many other applications.

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