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  • Equipment
    The Extrel VeraSpec™ MBx quadrupole mass spectrometer system is a discreetly pumped, three stage gas analysis developed for sampling condensable and reactive gases.
  • Equipment
    The Triaxis sputtering system is created and developed by engineering talents at Semicore, a Silicon Valley-based manufacturer.
  • News - 1 Jul 2004
    Global nanotechnology company pSivida Limited, is pleased to announce that its UK operating subsidiary pSiMedica Limited has been granted a new Australian patent for BioSiliconTM. Australian Patent...
  • Article - 6 Aug 2002
    Physical vapour deposition (PVD) is a coating process that involves evaporation and deposition of a material. It is used in a range of industries for applications such as improving hardness, wear...
  • News - 7 May 2004
    Free neutrons are usually pretty speedy customers, buzzing along at a significant fraction of the speed of light. But physicists have created a new process to slow neutrons down to about 15 miles per...
  • News - 17 Feb 2004
    IBM recently announced it has developed a new method of manufacturing low power, high performance microprocessors using an industry-first combination of silicon-on-insulator (SOI), strained silicon...
  • Article - 26 Oct 2001
    Titanium is becoming a more widely use engineering material for reasons such as corrosion resistance, strength and low maintenance. However, to get the best performance out of it, it must be utilised...
  • Webinar - 15 May 2024
    This webinar explores the groundbreaking capabilities of FusionScope, showcasing live nanoparticle measurements, interactive Q&A with experts, and a glimpse into upcoming system...
  • Article - 29 Aug 2001
    Using a proprietary production process involving multilayers of copper, a new generation of computer chip is being produced. These overcome the poisoning effects of copper on silicon and have superior...
  • Webinar - 15 Apr 2019
    Getting a good background on multiphase samples can be tricky. Intensity can vary between the phases by enough to cause oversaturation in one phase and undersaturation in another.

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