Posted in | Materials Testing and Characterisation

Issues of Nitric Acid, Hydrofluoric Acid and Osmium from Inorganic Ventures

In this video, Dr. Brain Alexander and Dr. Paul Gaines from Inorganic Ventures talks about the issues in nitric acid, hydrofluoric acid and osmium. Os should not be exposed to any oxidizing agents to avoid the formation of OsO4. The tetroxide is very volatile and toxic. A common mistake is to dilute Os containing solutions with solutions containing nitric acid. Tetroxide formation is slow but will cause false high readings due to the increased amount of the gaseous tetroxide reaching the plasma.

Run Time – 1:40min

What about Nitric Acid, Hydrofluoric Acid and Osmium issues?

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