Posted in | Coatings | Materials Processing | Materials Testing and Characterisation | Pittcon 2009 Interviews

The Hiden EQP Mass Spectrometer for Plasma Characterisation

Hiden Analytical's Mark Buckley explains the operation and capabilities of the Hiden EQP mass spectrometer which is used for plasma characterisation. It is typically used by process development engineers and research technicians to optimise plasma conditions for the manufacture and fabrication of new and novel devices.

It is an in vaccum system that combines with a quadrupole mass spectrimeter with high resolution image analyser that samples neutrals, radicals, positive and negative ions from plasma systems.

It can be adapted for spatial analysis and is commonly used in industries such as semiconductors, photovoltaics, ion milling and other surface modification and coating applications.

The Hiden EQP

Run time - 2:32 min

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