Imago Scientific to Show Off Atomic Scale Microscopy Technology

Imago Scientific Instruments Corp. will showcase its revolutionary LEAP® Microscope at the ISTFA conference (booth 516) to be held November 6 – 10, 2005 at the San Jose McEnery Convention Center. The LEAP® analyzes materials by removing and examining individual atoms, enabling metrology at the atomic scale. The true power of the LEAP® lies in it’s ability to tie compositional information to structure on the atomic scale, thereby allowing manufacturers to identify, analyze, and eliminate nanometer scale defects which result in yield loss.

The decreasing feature sizes used in the microelectronics industry are challenging failure analysis engineers to analyze materials on an atomic scale. For example, manufacturers of read heads want to understand why some of their read heads, which are composed of multiple layers as thin as five angstroms (one to two atom spacings), are working well while others are not. Visitors to the Imago Scientific Instruments Corp. exhibit will be provided information on how the LEAP® Microscope can be used to perform failure analysis on the atomic scale.