The Mega II is an efficient, automated closed loop, solvent regenerative, electronic assembly and parts cleaning system with quantitative ionic detection, removal and statistical process control capability.
- Designed for high reliability application
- Closed Loop Regenerative Cleaning System, No waste Stream, No Drain
- Environmentally Safe Design
- Onboard filters and resins
- Extremely low operating cost
- Cleans to same level, automatic process control
- Wash, rinse, test and dry in one chamber
- Fast cycle times
- Test and cleans simultaneously, ISO 9002 process control
- Chamber sizes up to 23" x 9' x 12"
- Spray under immersion, solvent wash and solvent rinse
- Optional DI water rinse, optional second chemistry wash
- Optional ultrasonic energy to facilitate particle removal